RF Sputter Deposition
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. Material is ejected from a target (source) onto a substrate. This technique provides to grow high quality thin films of various metals, insulators and semiconductors. In particular, this technique is used to prepare high quality electrodes for various types of electronic devices.
Contact: Dr. Kartik Ghosh, Professor
Kemper Hall 103G, 417-836-6205