RF Sputter Deposition

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. Material is ejected from a target (source) onto a substrate. This technique provides to grow high quality thin films of various metals, insulators and semiconductors. In particular, this technique is used to prepare high quality electrodes for various types of electronic devices.

When not in use by faculty or students, it can be reserved for use. Click here to rent per hour. Please contact the department for scheduling.

Contact: Dr. Kartik Ghosh, Professor

KartikGhosh@MissouriState.edu

Kemper Hall 103G, 417-836-6205

RF Sputter Deposition